High-yield fabrication of perpendicularly magnetised synthetic antiferromagnetic nanodiscs

Abstract Synthetic antiferromagnetic (SAF) particles with perpendicular anisotropy display a number of desirable characteristics for applications in biological and other fluid environments. We present an efficient effective method the patterning ultrathin Ruderman-Kittel-Kasuya-Yoshida coupled, perpendicularly magnetised SAFs using combination nanosphere lithography ion milling. A Ge sacrificial layer is utilised, which provides clean simple lift-off process, as well maintaining key magnetic properties that are beneficial to target applications. demonstrate capable producing particularly high yield well-defined, thin film based nanoparticles.